Am 29. Oktober 2026 um 14 Uhr (c.t.) findet das nächste Physikalische Kolloquium statt. Prof. Dr. Richard Engeln ist Associate Professor in der Forschungsgruppe „ Plasma and Materials Processing“ am Institut für Angewandte Physik der Technischen Universität Eindhoven und forscht am ASML. Er hält einen Vortrag zum Thema „Unravelling EUV-Induced Hydrogen Plasma“.
Abstract von Prof. Engeln:
ASML’s latest lithography systems use 13.5 nm extreme ultraviolet (EUV) light to enable increasingly small semiconductor features. This light is generated by irradiating tin droplets with a pulsed CO2 laser, producing a tin plasma at a repetition rate of 50 kHz. The emitted EUV light is directed into the scanner, where it patterns resist-coated wafers. To optimize scanner conditions, hydrogen gas is introduced at pressures of a few pascals. As EUV photons propagate through the scanner’s hydrogen background gas, a low-density yet highly reactive plasma is generated. The resulting plasma ions, radicals, and photons strongly affect processes at critical scanner surfaces. The atomic and molecular ion densities depend strongly on the neutral-species densities through rapid charge-exchange (CE) and dissociative-attachment (DA) reactions. At ASML Research, we combine experimental and modelling efforts to characterize, in terms of densities and fluxes of plasma-generated species, EUV-induced hydrogen plasmas. During the presentation I will highlight several of our ongoing experimental efforts.
Prof. Dr. Ir. Jean-Pierre H. van Helden gibt eine Einführung in den Vortrag.
Die Fakultät lädt alle Interessierten herzlich ein. Die Veranstaltung findet im Hörsaal HZO 20 statt.
Foto: EUV lithography systems – Products © ASML